"Ga离子束 FIB 1.分辨率 Resolution:≤3.0nm@30kV 2.镜筒Column:Ion-sculptor 3.束流Ion beam current:1pA-100nA 扫描电镜 SEM
1. 分辨率 Resolution:<0.9nm@15kV
2. 加速电压 Acceleration voltage:0.5kV~30kV
(1)超高分辨率的FIB可以实现纳米级别的精细加工、图案化、三维重构分析,尤其是制备定区域TEM薄片。Ultra-high resolution FIB can be used for nano scale fabrication, patterning,3D reconstruction, especially for the preparation of TEM lamella with fixed area.
(2)配备飞秒激光加工模块,可以实现精准定位并快速达到微米级范围的加工. Femtosecond laser can quickly achieve micro scale fabrication at precise position.
(3)配备和飞行时间二次离子质谱TOF-SIMS可实现ppm级的元素分析和同位素分析,非常适合薄膜和掺杂样品的分析。TOF-SIMS has excellent spatial resolution and high Z-direction resolution,which makes it very suitable for thin film and adulterate specimen analysis, trace element analysis and isotope analysis.
(4)配备辅助刻蚀和沉积系统,主要气体有XeF2、H2O、C、Pt、W。Equipped with auxiliary etching and deposition systems, the main gases are XeF2, H2O, C, Pt, W.
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